درمان با پلاسما کمک می کند تا آشکار شود که پوشش های مولکولی چگونه سیلیکون را دوا می کنند

Plasma treatment helps reveal how molecular coatings dope silicon

Controlling dopant concentration near the silicon surface is increasingly important for ultrashallow junctions and nanoscale devices. Mixed monolayer doping (MMLD) offers a surface-chemistry-based approach in which dopant-containing molecules are mixed with nondopant molecules to tune the amount of dopant available at the silicon surface before thermal diffusion.